| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography system. <P>SOLUTION: A maskless lithography system for transferring a pattern onto a surface of a target, comprises: at least one beam generator for generating a plurality of small beams; modulation means comprising a plurality of modulators for modulating magnitude of the small beam; and a control unit for controlling each of the modulators. The control unit generates pattern data and transmits the pattern data to the modulation means for controlling the magnitude of each small beam. The control unit comprises: at least one data storage for storing the pattern data; at least one readout unit for reading out the pattern data from the data storage; at least one data converter for converting the pattern data that is read out from the data storage into at least one modulated light beam; and at least one optical transmitter for transmitting at least one modulated light beam to the modulation means. <P>COPYRIGHT: (C)2013,JPO&INPIT |
