| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate case cleaning device which can be cleaned even when an object to be cleaned has a complicated shape in executing dry cleaning of the substrate case. <P>SOLUTION: A cleaning device 1 of a door part 2 of a substrate case includes: the door part 2 which holds a substrate which is vulnerable to adhesion of foreign matters, such as a silicon wafer and a photo mask; a cover part for preventing the foreign matters from being adhered to the substrate held by shielding the door part 2 from a surrounding atmosphere; and packings 5 which are provided at the door part 2 and used for tightly sealing the door part 2 and the cover part. A substrate case cleaning device 1 includes: a turn unit 3 for placing at least the door part thereon and rotating it; and a gas jet nozzle 4 which jets cleaning gas toward the door part 2. <P>COPYRIGHT: (C)2013,JPO&INPIT |
