发明名称 |
METHOD FOR MANUFACTURING COLOR FILTER SUBSTRATE, OPTICAL MASK, AND PHOTOREACTION LAYER |
摘要 |
<p>A method for manufacturing a color filter substrate, comprising the steps of: providing a substrate (10); providing a photoreaction layer (20) covered on the substrate (10); providing an optical mask (30) disposed above the photoreaction layer (20); providing different frequency bands of light to irradiate the photoreaction layer (20) through the optical mask (30) to form color resist areas (201, 203, 205) and a black matrix (207) respectively on the photoreaction layer (20). Also disclosed are the optical mask (30) and the photoreaction layer (20) for manufacturing the color filter substrate. The manufacturing method has the advantages of shortening the processing cycle period, and improving aperture ratio and display contrast.</p> |
申请公布号 |
WO2012162933(A1) |
申请公布日期 |
2012.12.06 |
申请号 |
WO2011CN77471 |
申请日期 |
2011.07.22 |
申请人 |
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.;CHEN, HSIAO HSIEN;LEE, KUAN-CHENG |
发明人 |
CHEN, HSIAO HSIEN;LEE, KUAN-CHENG |
分类号 |
G02B5/20;G02F1/1335 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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