发明名称 COMPOUND SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING SAME, AND LIGHT EMITTING ELEMENT USING COMPOUND SEMICONDUCTOR SUBSTRATE
摘要 <p>This compound semiconductor substrate has, on a second GaP window layer, a light emitting layer configured of a double hetero structure composed of a lower cladding layer represented by the formula of (AlxGa1-x)yIn1-yP (0<x<1, 0<y<1), an active layer, and an upper cladding layer, and has a first GaP window layer on the light emitting layer. The compound semiconductor substrate is characterized in that the lattice constants of the lower cladding layer, the active layer, and the upper cladding layer match such that respective differences (??) between a Bragg angle on the (400) plane of a GaAs single crystal and respective Bragg angles on the (400) planes of the lower cladding layer, the active layer and the upper cladding layer are within the range of 50"-200" at a room temperature. Consequently, the high-quality compound semiconductor substrate is provided, said semiconductor substrate having improved light emitting service life characteristics, less variance of the light emitting service life characteristics within the plane, and furthermore, improved luminance.</p>
申请公布号 WO2012164847(A1) 申请公布日期 2012.12.06
申请号 WO2012JP03192 申请日期 2012.05.16
申请人 SHIN-ETSU HANDOTAI CO., LTD.;TAKAHASHI, MASANOBU;SAKAI, KENJI;SHINOHARA, MASAYUKI 发明人 TAKAHASHI, MASANOBU;SAKAI, KENJI;SHINOHARA, MASAYUKI
分类号 H01L33/30;H01L21/205 主分类号 H01L33/30
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