发明名称 SUBSTRATE LOADING APPARATUS AND SUBSTRATE LOADING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate loading apparatus which can prevent displacement of a substrate due to air entrainment. <P>SOLUTION: A substrate loading apparatus 100 loading a substrate 10 comprises a stage 30 holding the substrate 10 and a vacuum chuck 31 absorbing the substrate 10. The vacuum chuck 31 includes suction holes 32 arranged on a surface 30s of the stage 30 and the vacuum chuck 31 sucks the substrate 10 from one end 30a toward another end 30b of the stage 30. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012238758(A) 申请公布日期 2012.12.06
申请号 JP20110107342 申请日期 2011.05.12
申请人 SHARP CORP 发明人 NAKAMURA KENTA
分类号 H01L21/683 主分类号 H01L21/683
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