| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an arc evaporation source which can generate a line of magnetic force elongating from the surface of a target to a direction of a base material in a wide region on the surface of the target. <P>SOLUTION: The arc evaporation source 1a includes: a ring-shaped circumferential magnet 3 which is so arranged as to surround the outer periphery of a target 2; and a ring-shaped rear surface magnet 4a which is arranged on the rear surface side of the target 2. In the arc evaporation source 1a, the circumferential magnet 3 has a polarity parallel to the front surface of the target 2 and becoming to a magnetization direction which faces the front direction. The rear surface magnet 4a has a polarity parallel to the front surface of the target 2 and also becoming to a magnetization direction which faces the inner direction of a ring diameter and further has an internal diameter more than that of the target 2. <P>COPYRIGHT: (C)2013,JPO&INPIT |
