| 发明名称 |
APPARATUS AND PROCESS FOR ATOMIC LAYER DEPOSITION |
| 摘要 |
Provided are atomic layer deposition apparatus and methods including a gas distribution plate with a thermal element. The thermal element is capable of locally changing the temperature of a portion of the surface of the substrate by temporarily raising or lowering the temperature. |
| 申请公布号 |
WO2012118947(A3) |
申请公布日期 |
2012.12.06 |
| 申请号 |
WO2012US27240 |
申请日期 |
2012.03.01 |
| 申请人 |
APPLIED MATERIALS, INC.;YUDOVSKY, JOSEPH |
发明人 |
YUDOVSKY, JOSEPH |
| 分类号 |
C23C16/44;C23C16/455;H01L21/205 |
主分类号 |
C23C16/44 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
