| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing system in which the detection time of a substrate can be shortened, and thereby the throughput of processing the substrate can be enhanced, and to provide a substrate detection device and a substrate detection method. <P>SOLUTION: The substrate processing system 1 comprises: a first detection unit 40 which detects a wafer W in the state before processing; and a second detection unit 50 which detects a wafer W in the state after processing. The first detection unit 40 detects whether or not a wafer W in the state before processing has been housed in each housing part 82 of a housing container 80, and detects the housing state of each wafer W in the state before processing housed in each housing part 82. The second detection unit 50 detects collectively whether or not a wafer W in the state after processing has been housed in each housing part 82 of the housing container 80. <P>COPYRIGHT: (C)2013,JPO&INPIT |
