发明名称 FLUORINE-CONTAINING RESIN AND PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a fluorine-containing resin achieving excellent ink repellency and sustentation thereof, ink droppability and sustentation thereof, and developability. <P>SOLUTION: This fluorine-containing resin contains an Rf group (a) comprising a polyfluoroether structure represented by formula: -(X-O)<SB POS="POST">n</SB>-Y and an acidic group (b), has an acid value of 1-300 mgKOH/g, has the content of fluorine atom of 5-40%, and has solubility in an aqueous alkali solution, (in the formula, X is a 1-10C bivalent saturated hydrocarbon group or 1-10C fluorinated bivalent saturated hydrocarbon group, and represents the same or different group in every unit tied up by n; Y represents a hydrogen atom (limited to the case that no fluorine atom is bonded to a carbon atom adjacent to an oxygen atom adjacent to Y), 1-20C monovalent saturated hydrocarbon group or 1-20C fluorinated saturated hydrocarbon group; and n denotes an integer of 2-50, provided that the total number of fluorine atoms in the formula is 2 or more). <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012236999(A) 申请公布日期 2012.12.06
申请号 JP20120153346 申请日期 2012.07.09
申请人 ASAHI GLASS CO LTD 发明人 TAKAHASHI HIDEYUKI;ISHIZEKI KENJI;SHIRAKAWA DAISUKE
分类号 C08F220/22;G03F7/038;H01L21/027 主分类号 C08F220/22
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