发明名称 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
摘要 Provided is a substrate processing apparatus. The substrate processing apparatus includes an index part including a port on which a container containing a substrate is placed and an index robot, a processing part for processing the substrate, and a buffer unit disposed between the processing part and the index part to allow the substrate transferred between the processing part and the index part to be temporarily stayed therein. The processing part includes a glue removal processing module, a substrate cooling processing module, a heat processing module, and a functional water processing module which are disposed along a transfer passage for transferring the substrate.
申请公布号 US2012305024(A1) 申请公布日期 2012.12.06
申请号 US201213483703 申请日期 2012.05.30
申请人 KANG BYUNG CHUL;KANG BYUNG MAN;JANG DONGHYUK;KIM SEONG-SOO;SEMES CO., LTD. 发明人 KANG BYUNG CHUL;KANG BYUNG MAN;JANG DONGHYUK;KIM SEONG-SOO
分类号 B08B7/04;B08B3/00;B08B3/08 主分类号 B08B7/04
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