发明名称 METHOD OF PRODUCING SILICON CARBIDE SINGLE CRYSTAL
摘要 A method of producing an SiC single crystal is provided in which an SiC single crystal is grown on a first seed crystal held at a lower end of a seed crystal holder, by immersing the first seed crystal in a source material melt in a crucible; this method of producing an SiC single crystal is characterized by carrying out a treatment that promotes the growth of a polycrystal in a region outside the first seed crystal.
申请公布号 US2012304916(A1) 申请公布日期 2012.12.06
申请号 US201113577500 申请日期 2011.02.17
申请人 ISHII TOMOKAZU;TOYOTA JIDOSHA KABUSHIKI KAISHA 发明人 ISHII TOMOKAZU
分类号 C30B19/08 主分类号 C30B19/08
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