| 摘要 |
<p>PURPOSE: A lithography device including a substrate table is provided to set a substrate table on a position at which the focus of a substrate is accurate. CONSTITUTION: A lithography device includes a light illumination system, a support, a substrate table(WT), a position setting unit(PD), a projection system(PS), a substrate surface actuator, and a position controller. The light illumination system conditions radiation beams. The support supports patterning devices for patterning the radiation beams. The substrate table keeps a substrate(W). The position setting unit positions the substrate table. The projection system projects the patterned radiation beams to the target part of the substrate. The substrate surface actuator applies force to a part of the surface of the substrate facing to the projection system. The position controller controls the position of the substrate table.</p> |
