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经营范围
发明名称
Lithographic apparatus comprising a gas shower
摘要
申请公布号
EP1777590(B1)
申请公布日期
2012.12.05
申请号
EP20060076909
申请日期
2006.10.20
申请人
ASML NETHERLANDS B.V.
发明人
VAN EMPEL, TJARKO ADRIAAN RUDOLF;VAN DER HAM, RONALD;ROSET, NIEK JACOBUS JOHANNES
分类号
G03F7/20
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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