| 摘要 |
<p>PURPOSE: A vapor delivery device, a manufacturing method thereof, and the use thereof are provided to prevent channels and cavities formed in a large amount of solid precursor compounds by uniformly consuming the surface of the solid precursor compounds. CONSTITUTION: A delivery system comprises a delivery device with inlet and outlet ports, a first proportional control valve(112), a chemical sensor(104) located in the downstream of the transfer device to analyze the chemical contents of fluid stream from the delivery device and connected to the first proportional control valve, and a first pressure/flow controller(108) connected to the chemical sensor and the first proportional control valve. The delivery system delivers uniform moles of precursor vapor per unit volume of carrier gas to a plurality of reactors(200).</p> |
