| 摘要 |
PURPOSE: An antistatic silicon release film is provided to have excellent adhesion between a substrate and a coating layer because a hardening disturbance of a release layer is not occurred. CONSTITUTION: An antistatic silicon release film comprises a polyester substrate film, a coating layer coated with a silicon releasing composition with carbon nanotubes on at least one side of the polyester substrate film. The silicon releasing composition with the carbon nanotubes comprises 1-10 parts by weight of carbon nanotubes based on 100.0 parts by weight of polysiloxane and the solid content of the silicon releasing composition is 1-5 weight%. The surface resistance(Ω/sq), releasing force and residual adhesive ratio of the coating layer are 0-10^10, 0-30 gf/in, 80-100% respectively.
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