发明名称 APPARATUS FOR CLEANING WAFER CARRIER
摘要 PURPOSE: A semiconductor carrier cleaning device is provided to efficiently clean the inside of a semiconductor carrier by including a cleaning device which is optimal for an inner shape of a semiconductor carrier. CONSTITUTION: A sealing chamber(110) includes an openable cover(114). A carrier receiving unit(120) is installed on the inner lower side of the sealing chamber. A rotating plate(130) is installed in the lower center of the sealing chamber. A DI high pressure spray unit(140) sprays deionized water of high pressure to a semiconductor carrier(12). A high pressure gas spray unit(150) sprays gas of high pressure to the semiconductor carrier.
申请公布号 KR20120131785(A) 申请公布日期 2012.12.05
申请号 KR20110050197 申请日期 2011.05.26
申请人 发明人
分类号 H01L21/02;H01L21/302;H01L21/68 主分类号 H01L21/02
代理机构 代理人
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