发明名称 Semiconductor device and method of manufacturing the same
摘要 A semiconductor device has a ferroelectric capacitor having a ferroelectric film, an interlayer insulating film having a first layer formed on the ferroelectric capacitor, a plug and a wiring connecting to the ferroelectric capacitor, and a dummy plug in the vicinity of the ferroelectric capacitor.
申请公布号 US8324671(B2) 申请公布日期 2012.12.04
申请号 US20080068912 申请日期 2008.02.13
申请人 DOTE AKI;IZUMI KAZUTOSHI;FUJITSU SEMICONDUCTOR LIMITED 发明人 DOTE AKI;IZUMI KAZUTOSHI
分类号 H01L29/92 主分类号 H01L29/92
代理机构 代理人
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