发明名称 |
Plasma generation controlled by gravity-induced gas-diffusion separation (GIGDS) techniques |
摘要 |
The invention can provide apparatus and methods of processing a substrate using plasma generation by gravity-induced gas-diffusion separation techniques. By adding or using gases including inert and process gases with different gravities (i.e., ratio between the molecular weight of a gaseous constituent and a reference molecular weight), a two-zone or multiple-zone plasma can be formed, in which one kind of gas can be highly constrained near a plasma generation region and another kind of gas can be largely separated from the aforementioned gas due to differential gravity induced diffusion and is constrained more closer to a wafer process region than the aforementioned gas. |
申请公布号 |
US8323521(B2) |
申请公布日期 |
2012.12.04 |
申请号 |
US20100853771 |
申请日期 |
2010.08.10 |
申请人 |
ZHAO JIANPING;CHEN LEE;FUNK MERRITT;NOZAWA TOSHIHISA;TOKYO ELECTRON LIMITED |
发明人 |
ZHAO JIANPING;CHEN LEE;FUNK MERRITT;NOZAWA TOSHIHISA |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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