| 发明名称 |
Positive resist processing liquid composition and liquid developer |
| 摘要 |
Disclosed is a positive resist processing liquid composition which is composed of an aqueous solution containing a quaternary ammonium hydroxide represented by the following general formula (I). In the formula, R1 and R3 independently represent a methyl group, and R2 represents an alkyl group having 12-18 carbon atoms. |
| 申请公布号 |
US8323880(B2) |
申请公布日期 |
2012.12.04 |
| 申请号 |
US20070310054 |
申请日期 |
2007.08.10 |
| 申请人 |
MURAKAMI YUTAKA;ISHIKAWA NORIO;MURATA TAKU;SAITO KENJI;ARAKI RYOSUKE;KANTO KAGAKU KABUSHIKI KAISHA |
发明人 |
MURAKAMI YUTAKA;ISHIKAWA NORIO;MURATA TAKU;SAITO KENJI;ARAKI RYOSUKE |
| 分类号 |
G03F7/26 |
主分类号 |
G03F7/26 |
| 代理机构 |
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代理人 |
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| 主权项 |
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