发明名称 Methods of treating a surface to promote metal plating and devices formed
摘要 Embodiments of the present invention provide methods of treating a surface of a substrate. In one particular aspect, embodiments of the present invention provide methods of treating a surface of a substrate that promote binding of one or more metal elements to the surface. According to some embodiments of the invention, films are formed on any conducting, semiconductive or non-conductive surface, by thermal reaction of molecules containing reactive groups in an organic solvent or in aqueous solution. The thermal reaction may be produced under a variety of conditions. In another aspect, the present invention provides a printed circuit board, comprising: at least one substrate; a layer of organic molecules attached to the at least one substrate; and a metal layer atop said layer of organic molecules.
申请公布号 US8323769(B2) 申请公布日期 2012.12.04
申请号 US20090628978 申请日期 2009.12.01
申请人 KUHR WERNER G.;SHI STEVEN Z.;WEI JEN-CHIEH;LIU ZHIMING;WEI LINGYUN;ATOTECH DEUTSCHLAND GMBH 发明人 KUHR WERNER G.;SHI STEVEN Z.;WEI JEN-CHIEH;LIU ZHIMING;WEI LINGYUN
分类号 B32B3/10;B32B15/04;B32B15/08 主分类号 B32B3/10
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