发明名称 |
Application liquid and method for formation of a silica-based coating film using the application liquid |
摘要 |
An application liquid capable of forming a dense silica-based coating film even when embedded into a fine groove, and a method for formation of a silica-based coating film using the application liquid are provided. An application liquid is used including (A) a siloxane polymer, and (B) a base generator represented by the following general formula (I): wherein, R1 and R2 are a hydrocarbon group having 1 to 5 carbon atoms and which may be the same or different; or one of R1 and R2 is a hydrogen atom and the other is a hydrocarbon group having 1 to 5 carbon atoms; when R1 and R2 are both a hydrocarbon group, these may bind to one another to form a ring structure; R3 is a linking group; and R4 is a condensed ring. |
申请公布号 |
US8323745(B2) |
申请公布日期 |
2012.12.04 |
申请号 |
US20100748146 |
申请日期 |
2010.03.26 |
申请人 |
YAMADAYA TOKONORI;ISHIKAWA KIYOSHI;SAWANO ATSUSHI;TOKYO OHKA KOGYO CO., LTD. |
发明人 |
YAMADAYA TOKONORI;ISHIKAWA KIYOSHI;SAWANO ATSUSHI |
分类号 |
B05D3/02 |
主分类号 |
B05D3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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