发明名称 Semiconductor device having oxide semiconductor layer
摘要 Disclosed is a highly reliable semiconductor device and a manufacturing method thereof, which is achieved by using a transistor with favorable electrical characteristics and high reliability as a switching element. The semiconductor device includes a driver circuit portion and a pixel portion over one substrate, and the pixel portion comprises a light-transmitting bottom-gate transistor. The light-transmitting bottom-gate transistor comprises: a transparent gate electrode layer; an oxide semiconductor layer over the gate electrode layer, a superficial layer of the oxide semiconductor layer including comprising a microcrystal group of nanocrystals; and source and drain electrode layers formed over the oxide semiconductor layer, the source and drain electrode layers comprising a light-transmitting oxide conductive layer.
申请公布号 US8324621(B2) 申请公布日期 2012.12.04
申请号 US20100899962 申请日期 2010.10.07
申请人 YAMAZAKI SHUNPEI;SAKATA JUNICHIRO;AKIMOTO KENGO;NODA KOSEI;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI;SAKATA JUNICHIRO;AKIMOTO KENGO;NODA KOSEI
分类号 H01L29/12 主分类号 H01L29/12
代理机构 代理人
主权项
地址