| 摘要 |
<p>An objective especially for wave-lengths of less than or equal to 193 nm has a first part-objective having at least one continuous mirror, a second part-objective having at least one discontinuous primary concave mirror and a discontinuous secondary concave mirror, in which the primary concave mirror and the secondary concave mirror has an opening for entrance of the light beam bundle. Independent claims are included for the following (A) A micro-lithography projection exposure installation and (B) A method for exposing light-sensitive substrates.</p> |
