| 摘要 |
<p>Provided are a method for fabricating a porous carbon structure using optical interference lithography, and a porous carbon structure fabricated by same, wherein the method for fabricating a porous carbon structure using optical light interference lithography includes: forming a photoresist layer on a substrate; irradiating a three-dimensional optical interference pattern onto the photoresist formed using three-dimensional optical interference lithography to form a three-dimensional porous photoresist pattern; coating the formed three-dimensional porous photoresist pattern with an inorganic material; heating the photoresist pattern on which the inorganic material is coated to carbonize the pattern; and removing the coated inorganic material.</p> |
