| 摘要 |
PURPOSE: A susceptor for a chemical vapor deposition apparatus and the chemical vapor depositing apparatus including the same are provided to prevent source gas from being inputted to the bottom of a wafer during an epitaxial growth process by moving a wafer guide to a contact position with the edge of a wafer. CONSTITUTION: A susceptor(200) includes a pocket(210) which receives a wafer(W). A movable wafer guide(230) is installed in the pocket. The water guide includes a body unit(231) and a moving pin(232). The moving pin moves a body unit between a contact position and a separation position. The body unit includes a wall part(231a) and a bottom part(231b) which is extended from the wall part to the bottom of the wafer. |
