发明名称 POSITIVE PHOTOSENSITIVE SILOXANE COMPOSITION
摘要 A positive photosensitive siloxane composition obtained by hydrolyzing and condensing a silane compound represented by general formula (1) R1 nSi(OR2)4-n and containing a diazonaphthoquinone derivative, a solvent, and at least one of each of the following three types of polysiloxanes: a polysiloxane (A) such that if pre-baked the film thereof will be soluble in a 5 weight % TMAH aqueous solution and the solution rate of said film will be 1,000Å/sec or less; a polysiloxane (B) such that if pre-baked the solution rate of the film thereof will be 4,000Å/sec or more relative to a 2.38 weight % TMAH aqueous solution; and a polysiloxane (C) such that if pre-baked the solution rate of the film thereof will be between 200 and 3,000Å/sec relative to a 2.38 weight % TMAH aqueous solution. (In the formula, R1 represents a C1-20 linear or branched cyclic alkyl group, in which any methylene may be substituted by oxygen, or a C6-20 aryl group, in which any hydrogen may be substituted by fluorine; n represents a 0 or a 1; and R2 represents a C1-5 alkyl group.)
申请公布号 WO2012161025(A1) 申请公布日期 2012.11.29
申请号 WO2012JP62356 申请日期 2012.05.15
申请人 AZ ELECTRONIC MATERIALS IP (JAPAN) KK;YOKOYAMA DAISHI;FUKE TAKASHI;TASHIRO YUJI;SEKITO TAKASHI;NONAKA TOSHIAKI 发明人 YOKOYAMA DAISHI;FUKE TAKASHI;TASHIRO YUJI;SEKITO TAKASHI;NONAKA TOSHIAKI
分类号 G03F7/023;C08G77/04;G03F7/075;H01L21/027 主分类号 G03F7/023
代理机构 代理人
主权项
地址