<p>There is disclosed an apparatus for depositing nanomaterials; said apparatus comprising: at least one heating element; at least one sample holder (14) formed with a recess (14a) etched therethrough, said recess (14a) sized to fit a sample (10) and holding the sample (10) thereon; wherein one surface of the sample (10) is exposed to the heating element; at least one spacing member (16, 17) for holding the sample holder (14) in predetermined distance from that of the heating element; said spacing member (16, 17) is adjustably secured to the sample holder (14); at least one hole to channel in gases to be in contact with the sample (10); and at least one high temperature substrate (12). With the recess (14a) formed on the holder (14) of the present invention, only one surface of the sample is directly exposed for heating.</p>
申请公布号
WO2012161561(A1)
申请公布日期
2012.11.29
申请号
WO2012MY00105
申请日期
2012.05.22
申请人
MIMOS BERHAD;SHIH, TEH AUN;SHENG, DANIEL BIEN CHIA;SIN, TAN, KAI
发明人
SHIH, TEH AUN;SHENG, DANIEL BIEN CHIA;SIN, TAN, KAI