发明名称 METAL PATTERN MATERIAL AND MANUFACTURING METHOD THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a metallic pattern material capable of forming a metallic pattern of thin lines or small dots with high resolution after plating, and to provide a manufacturing method of the metallic pattern material. <P>SOLUTION: The manufacturing method of a metallic pattern material comprises the steps of: exposing a specified light sensitive material for plating formation in exposure at a pitch of 6 &mu;m or less with a laser power of 100% or less and [(pitch (&mu;m)&times;75/6+25)-30]-[(pitch (&mu;m)&times;75/6+25)+15]% to optimal power at the time of exposure at 6 &mu;m pitch; developing the light sensitive material for plating formation after exposure with a developer; and plating the light sensitive material for plating formation with a pattern formed after development at a plating bath ratio of 10 or less. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012234013(A) 申请公布日期 2012.11.29
申请号 JP20110101771 申请日期 2011.04.28
申请人 FUJIFILM CORP 发明人 USAMI YOSHIHISA;KONO TAKATSUGU
分类号 G03F7/038;C08F220/20;C23C18/20;C25D5/56;C25D7/00;G03F7/028;G03F7/40;H01L21/288 主分类号 G03F7/038
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