发明名称 |
METAL PATTERN MATERIAL AND MANUFACTURING METHOD THEREOF |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a metallic pattern material capable of forming a metallic pattern of thin lines or small dots with high resolution after plating, and to provide a manufacturing method of the metallic pattern material. <P>SOLUTION: The manufacturing method of a metallic pattern material comprises the steps of: exposing a specified light sensitive material for plating formation in exposure at a pitch of 6 μm or less with a laser power of 100% or less and [(pitch (μm)×75/6+25)-30]-[(pitch (μm)×75/6+25)+15]% to optimal power at the time of exposure at 6 μm pitch; developing the light sensitive material for plating formation after exposure with a developer; and plating the light sensitive material for plating formation with a pattern formed after development at a plating bath ratio of 10 or less. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2012234013(A) |
申请公布日期 |
2012.11.29 |
申请号 |
JP20110101771 |
申请日期 |
2011.04.28 |
申请人 |
FUJIFILM CORP |
发明人 |
USAMI YOSHIHISA;KONO TAKATSUGU |
分类号 |
G03F7/038;C08F220/20;C23C18/20;C25D5/56;C25D7/00;G03F7/028;G03F7/40;H01L21/288 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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