| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus which is advantageous for maintaining the function of blanking a charged particle beam. <P>SOLUTION: A charged particle beam lithography apparatus 1 is a lithography apparatus for writing on a substrate with a plurality of charged particle beams. The charged particle beam lithography apparatus 1 comprises blanking deflector arrays each including a plurality of deflectors for blanking the plurality of charged particle beams, respectively, in two-stage (blanking deflector arrays 14, 19). <P>COPYRIGHT: (C)2013,JPO&INPIT |
