| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a material vaporization supply apparatus for precisely adjusting material concentration in mixed gas, supplying the mixed gas to a process chamber in a stable manner, and facilitating the residual amount control of the material. <P>SOLUTION: A material vaporization supply apparatus comprises: a source tank 5 for accumulating material 4; a flow channel L<SB POS="POST">1</SB>for supplying carrier gas G<SB POS="POST">1</SB>given by a carrier gas supply source 1 to an inner-upper space 5a of the source tank 5; an automatic pressure regulator 15 for controlling the pressure in the inner-upper space 5a by adjusting an opening of a control valve CV<SB POS="POST">1</SB>; a flow channel L<SB POS="POST">2</SB>for supplying mixed gas G<SB POS="POST">0</SB>, which is mixture of material vapor produced from the material 4 and the carrier gas, to a process chamber 11; a flow rate controller 19 for automatically controlling the flow rate of the mixed gas G<SB POS="POST">0</SB>which is supplied to the process chamber 11 by adjusting an opening of a control valve CV<SB POS="POST">2</SB>; and a constant-temperature heater for heating the flow channel L<SB POS="POST">1</SB>and flow channel L<SB POS="POST">2</SB>at a set temperature. The mixed gas G<SB POS="POST">0</SB>is supplied to the process chamber 11 while the inner-upper space 5a is controlled at a desired pressure. <P>COPYRIGHT: (C)2013,JPO&INPIT |
