发明名称 METHODS AND APPARATUS TO IMPROVE RELIABILITY OF ISOLATED VIAS
摘要 A method for tiling selected vias in a semiconductor device is provided. The semiconductor device includes a plurality of vias. The method includes: generating a layout database for the semiconductor device; identifying isolated vias of the plurality of vias; selecting the isolated vias; defining a zone around each of the selected isolated vias; and adding tiling features on a metal layer above the selected isolated vias and within the zone. The method improves reliability of the semiconductor device by allowing moisture to vent from around the vias.
申请公布号 US2012299190(A1) 申请公布日期 2012.11.29
申请号 US201113114100 申请日期 2011.05.24
申请人 REBER DOUGLAS M.;HERR LAWRENCE N. 发明人 REBER DOUGLAS M.;HERR LAWRENCE N.
分类号 H01L23/48;G06F17/50 主分类号 H01L23/48
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