发明名称 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND LYOPHOBIC FILM
摘要 A positive photosensitive resin composition that forms an image for a liquid crystal display device and an organic EL display device, for example. The resin is made of a cured film that is highly water repellent and highly oleophobic on the surface. The resin has insulating properties, retains an excellent image and causes no reflow, for example, when being cured to form a film having excellent reworkability. A positive photosensitive resin composition comprising component (A), component (B), component (C) and component (D); Component (A) is an acrylic polymer containing an acid dissociable group, an aliphatic hydroxy group, and an N-substituted maleimide group; Component (B) is an acrylic polymer containing an acid dissociable group and a blocked isocyanate group; Component (C) is an acrylic polymer containing an acid dissociable group, an aliphatic hydroxy group, a C3-10 fluoroalkyl group, and a silyl ether group, and Component (D) is a photoacid generator.
申请公布号 US2012301827(A1) 申请公布日期 2012.11.29
申请号 US201113576847 申请日期 2011.02.01
申请人 HATANAKA TADASHI;UCHIYAMA MEGUMI;NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 HATANAKA TADASHI;UCHIYAMA MEGUMI
分类号 G03F7/075;G03F7/20 主分类号 G03F7/075
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