| 发明名称 |
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD |
| 摘要 |
An actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having a repeating unit represented by the following formula (1), a resist film using the composition, and a pattern forming method.
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| 申请公布号 |
US2012301817(A1) |
申请公布日期 |
2012.11.29 |
| 申请号 |
US201113575833 |
申请日期 |
2011.01.27 |
| 申请人 |
INASAKI TAKESHI;ITO TAKAYUKI;TSUCHIMURA TOMOTAKA;YATSUO TADATERU;TAKAHASHI KOUTAROU;FUJIFILM CORPORATION |
发明人 |
INASAKI TAKESHI;ITO TAKAYUKI;TSUCHIMURA TOMOTAKA;YATSUO TADATERU;TAKAHASHI KOUTAROU |
| 分类号 |
C08F261/02;G03F1/50;G03F7/20 |
主分类号 |
C08F261/02 |
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