EROSION INHIBITOR FOR CHEMICAL MECHANICAL POLISHING, SLURRY FOR CHEMICAL MECHANICAL POLISHING, AND CHEMICAL MECHANICAL POLISHING METHOD

摘要

The present invention provides an erosion inhibitor for chemical mechanical polishing, which contains (a) a compound that has four or more hydroxyl groups and a molecular weight of 100,000 or less and (b) a compound that has four or more amino groups, and wherein the mass ratio of the compound (a) to the compound (b) (namely, compound (a)/compound (b)) is 0.10-500.