| 摘要 |
<p>An illumination optical unit for projection lithography serves for illuminating an object field, in which a structure to be imaged can be arranged, with illumination light (3). The illumination optical unit has a mirror array (26) comprising a multiplicity of individual mirrors (27). The mirror array (26) is arranged in the illumination optical unit such that a change in an intensity distribution of the illumination light (3) on the mirror array (26) leads to a change in an illumination angle distribution of the illumination light (3) on the objet field (5). A ray deflecting device (25) for deflecting the illumination light (3) is arranged upstream of the mirror array (26) in the beam path of the illumination light (3). The ray deflecting device (25) is embodied in such a way that an intensity distribution (28a) of the illumination light (3) on the mirror array (26) is displaced on account of the ray deflection by the ray deflecting device (25). This results in an illumination optical unit which makes it possible to vary an illumination angle distribution for illuminating the object field between successive illumination processes with a tenable outlay and rapidly if possible.</p> |
