| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of producing a substrate for a liquid ejection head which rapidly etches a silicon substrate to preferably remove a sacrifice layer. <P>SOLUTION: The method of producing a substrate for a liquid ejection head, includes the steps of: forming the sacrifice layer on a surface of the silicon substrate in a region in which a liquid supply port is to open, the sacrifice layer containing aluminum which is selectively etched with respect to the silicon substrate; forming an etching mask on a rear surface of the silicon substrate, the etching mask having an opening corresponding to the sacrifice layer; a first etching step of etching the silicon substrate by using the etching mask as a mask and by using a first etchant containing 8 mass% or more and less than 15 mass% of tetramethylammonium hydroxide (TMAH); and after the first etching step, a second etching step of removing the sacrifice layer by using a second etchant containing 15 mass% or more and 25 mass% or less of TMAH. <P>COPYRIGHT: (C)2013,JPO&INPIT |
