发明名称 REGROWN SHOTTKY STRUCTURES FOR GAN HEMT DEVICES
摘要 Embodiments include but are not limited to apparatuses and systems including a buffer layer, a group III-V layer over the buffer layer, a source contact and a drain contact on the group III-V layer, and a regrown Schottky layer over the group III-V layer, and between the source and drain contacts. The embodiments further include methods for making the apparatuses and systems. Other embodiments may be described and claimed.
申请公布号 US2012302178(A1) 申请公布日期 2012.11.29
申请号 US201113115913 申请日期 2011.05.25
申请人 BEAM, III EDWARD A.;TRIQUINT SEMICONDUCTOR, INC. 发明人 BEAM, III EDWARD A.
分类号 H01L29/778;H01L21/335;H04B1/38 主分类号 H01L29/778
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