发明名称 MANUFACTURING METHOD FOR COLOR FILTER SUBSTRATE FOR REFLECTION TYPE LIQUID CRYSTAL DISPLAY DEVICE, AND COLOR FILTER SUBSTRATE OBTAINED THEREBY
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method for a color filter substrate for a reflection type liquid crystal display device which can maintain stable quality of a metal film as a reflection material through multiple imposition fabrication of single-wafer type by avoiding the exposure of the metal film to chemical liquid such as separation liquid in a process for separating an etching protective film, and provide a color filter substrate. <P>SOLUTION: The method comprises at least the steps of: forming a metal film on the entire surface of a substrate; forming an inorganic protective film on the metal film; forming a pattern of a dry-etching-resistant film on the inorganic protective film for a plurality of screens; forming a pattern of the inorganic protective film for the screens by performing dry etching on a portion of the inorganic protective film which is not coated with the dry-etching-resistant film; separating the dry-etching-resistant film on the inorganic protective film; forming a pattern of the exposed metal film for the screens through etching treatment; and applying and drying a photosensitive coloring resin composition on the entire surface of the substrate, and performing patterning of a color pixel through exposure to light, development, and baking, which is repeated according to the number of desired colors. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012234009(A) 申请公布日期 2012.11.29
申请号 JP20110101695 申请日期 2011.04.28
申请人 TOPPAN PRINTING CO LTD 发明人 SHIBATA YASUHIRO
分类号 G02B5/20;G02F1/1335 主分类号 G02B5/20
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