发明名称 |
COATING TREATMENT APPARATUS, COATING AND DEVELOPING TREATMENT SYSTEM, COATING TREATMENT METHOD, AND RECORDING MEDIUM HAVING PROGRAM RECORDED THEREON FOR EXECUTING COATING TREATMENT METHOD |
摘要 |
<p>Abstract of the DisclosureCOATING TREATMENT APPARATUS, COATING AND DEVELOPING TREATMENT SYSTEM, COATING TREATMENT METHOD, AND RECORDING MEDIUM HAVING PROGRAM RECORDED THEREON FOR EXECUTING COATING TREATMENT METHODA coating, treatment apparatus supplying a coating solution to a front surface of a rotated substrate and diffusing the supplied coating solution to an outer periphery side of the substrate to thereby apply the coating solution on the front surface of the substrate includes: a substrate holding part holding a substrate; a rotation part rotating the substrate held on the substrate holding part; a supply part supplying a coating solution to a front surface of the substrate held on the substrate holding part; and an airflow control plate provided at a predetermined position above the substrate held on the substrate holding part for locally changing an airflow above the substrate rotated by the rotation part at an arbitrary position.FIG. 5</p> |
申请公布号 |
SG185229(A1) |
申请公布日期 |
2012.11.29 |
申请号 |
SG20120028486 |
申请日期 |
2012.04.17 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KOUSUKE YOSHIHARA;KOJI TAKAYANAGI;SHINICHI HATAKEYAMA;KOHEI KAWAKAMI |
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