发明名称 |
METHOD OF FORMING ORIENTED BLOCK COPOLYMER LINE PATTERNS, BLOCK COPOLYMER LINE PATTERNS FORMED THEREBY, AND THEIR USE TO FORM PATTERNED ARTICLES |
摘要 |
A block copolymer film having a line pattern with a high degree of long-range order is formed by a method that includes forming a block copolymer film on a substrate surface with parallel facets, and annealing the block copolymer film to form an annealed block copolymer film having linear microdomains parallel to the substrate surface and orthogonal to the parallel facets of the substrate. The line-patterned block copolymer films are useful for the fabrication of magnetic storage media, polarizing devices, and arrays of nanowires.
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申请公布号 |
US2012301677(A1) |
申请公布日期 |
2012.11.29 |
申请号 |
US201213480506 |
申请日期 |
2012.05.25 |
申请人 |
RUSSELL THOMAS P.;HONG SUNG WOO;LEE DOUG HYUN;PARK SOOJIN;XU TING |
发明人 |
RUSSELL THOMAS P.;HONG SUNG WOO;LEE DOUG HYUN;PARK SOOJIN;XU TING |
分类号 |
B32B3/30;B05D3/02 |
主分类号 |
B32B3/30 |
代理机构 |
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代理人 |
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地址 |
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