发明名称 |
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR |
摘要 |
A resist composition comprising a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) comprising an acid generator (B1) composed of a compound represented by general formula (b1-1) shown below [wherein, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, provided that a ring skelton of the cyclic group contains an—SO2—bond or an—O—SO2—bond, and at least one carbon atom which is not adjacent to the—SO2—bond or the—O—SO2—bond has an oxygen atom as a substituent; Q1 represents a divalent linking group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; and A+ represents an organic cation]. [Chemical Formula 1] X-Q1-Y1—SO3⊖A⊕ (b1-1)
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申请公布号 |
US2012301829(A1) |
申请公布日期 |
2012.11.29 |
申请号 |
US201213478390 |
申请日期 |
2012.05.23 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
KAWAUE AKIYA;UTSUMI YOSHIYUKI |
分类号 |
C07D497/18;G03F7/027;G03F7/20 |
主分类号 |
C07D497/18 |
代理机构 |
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