OPTICAL PROFILE MEASURING APPARATUS, METHOD FOR MEASURING PROFILE, AND METHOD FOR MANUFACTURING A STRUCTURE WITH A PROFILE

摘要

A profile measuring apparatus is provided for accurately measuring a profile of a measuring object. A profile measuring apparatus includes: an irradiating unit (20) which is configured to irradiate the measuring object (3) with light from the light source to form a spotted pattern; a scanner (23) which is configured to relatively scan the surface of the measuring object with the spotted pattern; a light receiver (25) which includes a plurality of light-receiving pixels aligned to detect an image of the spotted pattern generated by the light irradiating the measuring object from a different direction different from an irradiation direction of the light irradiating the measuring object; a changing unit (70) which is configured to change positions, at which signals utilized to detect a position of the image of the spotted pattern are obtained, according to the irradiation direction of the light; and a controller (43) which is configured to calculate positional information of the measuring object based on the signals from the light-receiving pixels.