CHARGED PARTICLE BEAM APPARATUS AND ELECTROSTATIC CHUCK APPARATUS

摘要

The present invention improves reliability of an apparatus by applying a voltage corresponding to conditions. A charged particle beam apparatus (1) radiates an electron beam (16) to a sample (24) held on a sample stage (25) by means of an electrostatic chuck (30), and generates an image of the sample (24). The charged particle beam apparatus is provided with an electrostatic chuck control unit (13) which, at the time of holding the sample (24), applies a previously set initial voltage to a chuck electrode (26) of the electrostatic chuck (30), and determines whether the sample (24) is normally attracted to the electrostatic chuck (30). In the case where it is determined that the sample (24) is not normally attracted to the electrostatic chuck (30), the electrostatic chuck control unit increases the voltage to be applied to the chuck electrode (26) unit until it is determined that the sample (24) is normally attracted to the electrostatic chuck (30).