发明名称 EXPOSURE DATA GENERATION METHOD
摘要 An exposure data generation method includes generating a first multi-layer wiring pattern including a plurality of wiring layers according to a netlist and a wiring rule; dividing a layer pattern of each layer included in the generated first multi-layer wiring pattern by a subfield; by referring to a pattern database in which a subfield pattern of a wiring layer, included in a second multi-layer wiring pattern generated in the subfield according to the wiring rule, and a pattern identifier corresponding to the subfield pattern are registered, extracting the pattern identifier of the subfield pattern corresponding to the divided layer pattern of the first multi-layer wiring pattern; and generating exposure data including the extracted pattern identifier and an exposure position of the subfield pattern corresponding to the extracted pattern identifier.
申请公布号 US2012304134(A1) 申请公布日期 2012.11.29
申请号 US201213427179 申请日期 2012.03.22
申请人 SUGATANI SHINJI;MARUYAMA TAKASHI;FUJITSU SEMICONDUCTOR LIMITED 发明人 SUGATANI SHINJI;MARUYAMA TAKASHI
分类号 G06F17/50 主分类号 G06F17/50
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