发明名称 POLISHING PAD WITH HOMOGENEOUS BODY HAVING DISCRETE PROTRUSIONS THEREON
摘要 <p>Polishing pads with homogeneous bodies having discrete protrusions thereon are described. In an example, a polishing pad for polishing a substrate includes a homogeneous body having a polishing side and a back side. The homogeneous body is composed of a material having a first hardness. A plurality of discrete protrusions is disposed on and covalently bonded with the polishing side of the homogeneous body. The plurality of discrete protrusions is composed of a material having a second hardness different from the first hardness. Methods of fabricating polishing pads with homogeneous bodies having discrete protrusions thereon are also described.</p>
申请公布号 WO2012162066(A1) 申请公布日期 2012.11.29
申请号 WO2012US38212 申请日期 2012.05.16
申请人 NEXPLANAR CORPORATION;BAJAJ, RAJEEV;HUANG, PING;KERPRICH, ROBERT;ALLISON, WILLIAM C.;FRENTZEL, RICHARD;SCOTT, DIANE 发明人 BAJAJ, RAJEEV;HUANG, PING;KERPRICH, ROBERT;ALLISON, WILLIAM C.;FRENTZEL, RICHARD;SCOTT, DIANE
分类号 B24B37/20;B24B37/22;B24B37/24;B24B37/26;B24D18/00 主分类号 B24B37/20
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