POLISHING PAD WITH HOMOGENEOUS BODY HAVING DISCRETE PROTRUSIONS THEREON
摘要
<p>Polishing pads with homogeneous bodies having discrete protrusions thereon are described. In an example, a polishing pad for polishing a substrate includes a homogeneous body having a polishing side and a back side. The homogeneous body is composed of a material having a first hardness. A plurality of discrete protrusions is disposed on and covalently bonded with the polishing side of the homogeneous body. The plurality of discrete protrusions is composed of a material having a second hardness different from the first hardness. Methods of fabricating polishing pads with homogeneous bodies having discrete protrusions thereon are also described.</p>
申请公布号
WO2012162066(A1)
申请公布日期
2012.11.29
申请号
WO2012US38212
申请日期
2012.05.16
申请人
NEXPLANAR CORPORATION;BAJAJ, RAJEEV;HUANG, PING;KERPRICH, ROBERT;ALLISON, WILLIAM C.;FRENTZEL, RICHARD;SCOTT, DIANE
发明人
BAJAJ, RAJEEV;HUANG, PING;KERPRICH, ROBERT;ALLISON, WILLIAM C.;FRENTZEL, RICHARD;SCOTT, DIANE