| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device and a method for measuring plasma parameter data in a chamber of a plasma reactor. <P>SOLUTION: In order to measure plasma parameter data on the surface of a single flat surface Langmuir probe in contact with plasma, a bias capacitor 2 is connected between the single flat surface Langmuir probe 1 and a DC bias power source 3 on the surface of the single flat surface Langmuir probe 1 in contact with plasma. Subsequently, as a result of measurement of DC bias, the discharge current of the bias capacitor 2 is measured, and the probe potential in a single probe is measured during the discharge so that the presence and/or thickness of a dielectric film on the probe surface is detected. <P>COPYRIGHT: (C)2013,JPO&INPIT |
