| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve such a problem that the obtained mask error factor of a resist pattern is not always sufficiently satisfactory in a resist composition containing a salt conventionally known as an acid generator. <P>SOLUTION: The present invention relates to a salt represented by formula (I), wherein Q<SP POS="POST">1</SP>and Q<SP POS="POST">2</SP>each independently represent a fluorine atom or a 1-6C perfluoroalkyl group, n represents 0 or 1, L<SP POS="POST">1</SP>represents a single bond or a 1-10C alkanediyl group, a methylene group constituting the alkanediyl group may be replaced by an oxygen atom or a carbonyl group, L<SP POS="POST">1</SP>is not a single bond when n is 0, and Z<SP POS="POST">+</SP>represents an organic cation. <P>COPYRIGHT: (C)2013,JPO&INPIT |
