| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve the problem that the fidelity of reproduction of a pattern in a substrate largely depends on the dexterity of an operator. <P>SOLUTION: An apparatus for etching the pattern in an etching zone laid out on a substrate material includes a measuring unit for measuring position and orientation of an etching head 12 relative to the substrate 4, and a control unit 14 configured to calculate coordinates of the etching point as a function of the measured position and orientation of the etching head 12, to trigger etching if the calculated coordinates of the etching point correspond to coordinates of a point to be etched, the coordinates of the point to be etched being encoded in a prerecorded drawing of the pattern, and to automatically stop etching otherwise. <P>COPYRIGHT: (C)2013,JPO&INPIT |
