| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a fabrication method for a transparent conductive film which enable thin lines of a transparent conductive film having superior uniformity and high light transmittance and conductivity to be fabricated at high production efficiency, to provide the transparent conductive film obtained by the method, and to provide an electromagnetic wave shield for a plasma display using the transparent conductive film. <P>SOLUTION: According to the fabrication method for the transparent conductive film, a lattice of conductive thin lines is formed on a base material by an ink-jet method, using ink containing metal particulates. The size of a droplet of the ink delivered onto the base material is 0.05 pl or more to 1.0 pl or less, and a contact angle between the base material and the ink is 40 degrees or more to 90 degrees or less. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
