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发明名称
HAFNIUM SILICIDE TARGET FOR FORMING GATE OXIDE FILM AND METHOD FOR PREPARATION THEREOF
摘要
申请公布号
EP1408541(B1)
申请公布日期
2012.11.28
申请号
EP20020733313
申请日期
2002.06.05
申请人
JX NIPPON MINING & METALS CORPORATION
发明人
IRUMATA, SHUICHI;SUZUKI, RYO
分类号
H01L21/336;C22C27/00;C23C14/06;C23C14/08;C23C14/34;H01L21/28;H01L21/314;H01L21/316;H01L29/51;H01L29/78
主分类号
H01L21/336
代理机构
代理人
主权项
地址
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